| An Investigation of Ultrasonic Electroplating for Lithium Metal Anode Fabrication |
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Changmyeon Lee1,2, Beom Tak Na2, Jin-Young Hur2, Hongkee Lee2, Hideo Honma3, Osamu Takai3, Joo-Hyong Noh1,3 |
1Graduate School of Engineering, Kanto Gakuin University, Yokohama, 236-8501, Japan
2Industrial Components R&D Department, Korea Institute of Industrial Technology
3Materials and Surface Engineering Research Institute, Kanto Gakuin University, Yokohama, 236-8501, Japan |
Correspondence:
Changmyeon Lee, Tel: +82-32-850-0252,
Email: cmlee@kitech.re.kr
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Received: 29 November 2024 • Accepted: 31 January 2025 |
| Abstract |
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A high-speed pressurized electrodeposition process was developed for the fabrication of lithium metal anodes, aiming to advance the commercialization of lithium metal batteries (LMBs). This study systematically investigates the growth behavior of lithium under pressurized deposition at high current densities, addressing the challenge of dendritic lithium formation, which is a major limitation in LMB performance and safety. The effects of pressure and current density on the deposition process were analyzed, revealing that increased current density leads to non-uniform lithium growth and dendritic structures. To mitigate this, ultrasonic agitation was introduced during lithium electrodeposition. The application of ultrasound was found to enhance ion mobility, resulting in more uniform lithium deposition, reduced dendritic growth, and improved charge-discharge stability. This approach not only improves the structural integrity of lithium films but also optimizes deposition processes under high-current conditions, making it crucial for the practical implementation of LMBs. The results highlight the potential of combining pressurized deposition and ultrasonic assistance to enhance the electrochemical performance and reliability of lithium anodes, providing a significant step toward the commercialization of high-performance lithium metal batteries for energy storage applications. |
| Keywords:
Lithium electrodeposition, high current density, ultrasonic application, dendritic growth suppression, charge-discharge stability |
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